Journal Title：Materials Science In Semiconductor Processing

Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.

Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.

Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.

《半導(dǎo)體加工中的材料科學(xué)》為討論（光）電子、傳感器、探測器、生物技術(shù)和綠色能源的功能材料和器件的新型加工、應(yīng)用和理論研究提供了一個(gè)獨(dú)特的論壇。

每期都旨在提供當(dāng)前見解、新成就、突破和未來趨勢的快照，涉及微電子、能量轉(zhuǎn)換和存儲(chǔ)、通信、生物技術(shù)、（光）催化、納米和薄膜技術(shù)、混合和復(fù)合材料、化學(xué)加工、氣相沉積、器件制造和建模等不同領(lǐng)域，這些領(lǐng)域是先進(jìn)半導(dǎo)體加工和應(yīng)用的支柱。

內(nèi)容包括：亞微米器件的先進(jìn)光刻技術(shù)；蝕刻及相關(guān)主題；離子注入；損傷演變和相關(guān)問題；等離子體和熱 CVD；快速熱處理；先進(jìn)的金屬化和互連方案；薄介電層、氧化；溶膠-凝膠處理；化學(xué)浴和（電）化學(xué)沉積；復(fù)合半導(dǎo)體加工；新型非氧化物材料及其應(yīng)用； (大)分子和混合材料；分子動(dòng)力學(xué)、從頭算方法、蒙特卡羅等；分立電路和集成電路的新材料和新工藝；磁性材料和自旋電子學(xué)；異質(zhì)結(jié)構(gòu)和量子器件；半導(dǎo)體電學(xué)和光學(xué)特性的工程；晶體生長機(jī)制；可靠性、缺陷密度、固有雜質(zhì)和缺陷。

Materials Science In Semiconductor Processing創(chuàng)刊于1998年，由Elsevier Ltd出版商出版，收稿方向涵蓋工程技術(shù) - 材料科學(xué)：綜合全領(lǐng)域，此刊是中等級別的SCI期刊，所以過審相對來講不是特別難，但是該刊專業(yè)認(rèn)可度不錯(cuò)，仍然是一本值得選擇的SCI期刊 。平均審稿速度 約1.7個(gè)月 約3.7周，影響因子指數(shù)4.2，該期刊近期沒有被列入國際期刊預(yù)警名單，廣大學(xué)者值得一試。